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Clean-In-Place (CIP) Applications

CIP is the method used in sanitary processing plants to clean tanks, piping and even workspaces between production batches by automatically recirculating detergent and rinse solutions. The washing process consists of several cycles in which rinsing material is recycled through the vessels, pumps, valves and other process equipment in the flow system.

A Near Infrared (NIR) absorption or scattered light sensor is typically installed at the CIP return points where it is beneficial to measure the exact interface on rinse water push-outs and the clarity/quality of the final rinse water. Inline photometers can also be used to monitor the sanitizer concentration, to control the CIP process, for validation routines and in some cases, to monitor the residual after cleaning. Validation of cleaning procedures is of utmost importance to the pharmaceutical, food and specialty chemicals industry, while optimization of sanitizer usage offers significant cost savings.

CIP Clarity, Sanitizer Concentration Application schematic

Clean-In-Place (CIP) Applications Benefits

  • Reduced Water Usage
  • Reduced Sanitizer Consumption
  • Reduced Operating Costs
  • Reduced Wastewater Costs
  • Increased Efficiency - Reduced Cycle Times
  • Increase Available Process Time
  • Rapid ROI
CIP Return Water Clarity Monitoring
The quality of clean-in-place solutions can be monitored with an optek VIS Absorption or scattered light sensor installed at the CIP return point, depending in the nature of the product residue. The inline sensor can monitor the concentration of constituents in the water and detect acceptable/unacceptable contamination levels for recovered pre-rinse, while minimizing cycle time.

The CIP return sensor can be configured to enable a unique interface changeover point and final clarity. The product to water and CIP clarity levels can be monitored in real time. Based on the sensor output, it can divert the stream to recovery waste holding tanks, or to drain. Product can be recovered for reprocessing or the solution could be salvaged for CIP pre-rinse, saving countless gallons of water. This can dramatically reduce BOD costs or save otherwise lost product.

Sanitizer Concentration
Obtaining instantaneous measurement of the active sanitizer concentration in the cleaning solution is of great importance. In each cycle, the concentration of the active material increases until a steady state is reached and the wash cycle is considered to be complete. A new batch of rinsing material is then loaded and the same process is repeated. For maximum efficiency, the cycling should be stopped when the concentration of the active material reaches a plateau. Continuing the wash past this point is ineffective.

Chemical concentration has always been a difficult measurement using traditional conductivity sensors. Changes in pH and temperature, or the presence of unexpected compounds can all have an effect on conductivity-based devices. This may affect response times as well. To compensate for these issues, plant operators often overdose chemicals to ensure adequate sterilization, and then extend line flushes to insure its removal.

By installing an optek UV or VIS absoprtion sensor on the feed line, you can monitor and control the exact concentration of the feed. This provides the system with controlled cleaning and optimal performance, while reducing chemical usage. These sensors are also compensated to eliminate any influence from turbidity or the presence of other compounds. Through immediate response time, sanitizer and water usage is also greatly reduced.

Clean-In-Place (CIP) Applications Summary
This is a very popular and cost-saving application for optek inline photometers. In numerous worldwide installations, optek systems have proven to be the fastest and most precise method to monitor CIP. The amount of product recovered and water saved by the implementation of optek CIP monitors has provided plants with a typical payback within the first six months of installation.

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Benefits
Measurement Types
Constituents
Background Medium


Scattered Light
UV


Chlorine Dioxide
Chlorines
Iodophon
Residual Color
Residual Solids


Water